1. What is sputtering deposition?

Sputter deposition is a method of depositing thin films by sputtering material from a “target”. Sputtering is a term used to describe the mechanism in which atoms are ejected from the surface of a material when that surface is stuck by sufficiency energetic ions generated by low-pressure gas plasma, usually an argon plasma. The sputtering takes place at a much lower temperature than evaporation. Sputtered atoms ejected into the gas phase in vapor form are not in their thermodynamic equilibrium state and tend to condense on all surfaces in the vacuum chamber including the substrate.

2. Why are thin films important?

There are many useful applications for thin films. We desire to produce properties in a material that are often conflicting in nature if we use one homogeneous material. Semiconductor devices, for example, are fabricated on a thin layer deposited on a semiconductor substrate. The integrated electronic circuits depend on the confinement of electrical charges, which relies on the interfaces between different materials with different electronic properties. There are also many occasions when the properties demanded an engineering application involve features that are different for the surface than that are for the bulk. Depositing metal films and patterning them on the surface are relatively easy to secure electrical connection between semiconductor devices.

3.How does a sputtering system work?

Generally, in sputtering systems ions are generated and directed at a target, then ions sputter targets atoms. The ejected atoms are transported to the substrate and atoms condense and form a thin film. Below image shows the simple schematic of a sputtering system.

Sputter coater | SEM coater |Nanostructured coatings co

About

Nanostructured Coatings Co. (NSC) is a designer and manufacturer of high quality and reliable vacuum coating systems. The company was established in 2005 with the principal objective of supplying economically priced, high quality vacuum deposition systems for universities and research centers.

Mission Goals and Value

Providing our customers and partners with the most efficient and comprehensive solutions on vacuum processing equipment. Achieve incomparable situation in the Middle East and access to the key international markets of HV and UHV equipment through continuous improvement of our products’ performance, providing advanced technological support and improving customer service. We value our reputation and guarantee…

High Vacuum Dual Sputter and Carbon Coater– DSCT-300

The Desk SEM Coater model DSR1 is a compact coating system able to coat carbon film and noble metals such as gold, palladium, platinum and gold/palladium on non-conductive or poorly conductive specimens.

High Vacuum Desk Sputter/Carbon Coater – DSCT-T

The DSCT-T is configured as a sputter and carbon coater/ Thermal evaporator with interchangeable heads in one instrument suitable for SEM sample preparation.

Desk Sputter/Carbon Coater – DSCR-300

The large chamber rotary pumped DSCR-300, Desk Sputter and Carbon Coater is a compact coating system for both sputter and carbon coating.

Sputter Coater and Thermal Evaporator for Glove Box – DST2-TG

Double Target Turbo Pumped Sputter Coater and Thermal Evaporator, DST2-TG , is a multi-vacuum coater system that combines thermal evaporator and sputter coater.

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High Vacuum Dual Sputter and Carbon Coater– DSCT-300

High Vacuum Desk Sputter/Carbon Coater – DSCT-T

Desk Sputter/Carbon Coater – DSCR-300

Sputter Coater and Thermal Evaporator for Glove Box – DST2-TG

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